Patterning of thin films on various substrates is every day application for LCD, PDP and OLED displays and photovoltaics. Lasers may be used in processing on a variety thin films and multi-layers on rigid and flexible substrates.

As an example indium-tin oxide (ITO) film on a glass substrate patterning is one possible application. Low absorption of the material in the infrared and visible spectrum impeded clean removal of the material. On the other hand, the film can be completely ablated with the low energy density using the UV radiation, which is well absorbed by the oxide film. High quality processing of ITO without ridges is only possible using the laser with both a short wavelength and a short pulse duration.

Laser scribing of the OPV nanolayers allows for highly integrated modules with compact series interconnection of the OPV cells is another potential application. To maximize production throughput, laser scribing can be integrated in R2R production lines.

Also laser interference image containing modulated intensity can be utilized as a lithography tool or to pattern a material through laser ablation process directly. The laser beam interference patterning technique can be used to enhance fabrication speed of periodic patterns, compared to the conventional direct laser writing. Interference patterning allows distributing irradiation energy over a large fabrication area and producing sub-wavelength features in this area with a single exposition.

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